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Title:一种制备二硫化钼-石墨烯交替插层结构的方法
Institution:晶体材料研究院(晶体材料全国重点实验室)
Type of Patent:Invent
Application Number:2017107646314
Number of Inventors:2
Service Invention or Not:No
Application Date:2017-08-30
Publication Date:2019-04-12
Authorization Date:2019-04-12
Release Time:2019-04-15