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一种外延层非均匀分布的碳化硅SBD器件及其制作方法
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Title:一种外延层非均匀分布的碳化硅SBD器件及其制作方法

Institution:新一代半导体材料研究院

Type of Patent:Invent

Application Number:202410584864.6

Number of Inventors:4

Service Invention or Not:No

Application Date:2024-05-13

Publication Date:2024-08-06

Authorization Date:2024-08-06

Release Time:2024-10-16

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Gender : Male

School/Department : 新一代半导体材料研究院

Date of Employment : 2020-11-15

Faculty/School : Integrated Technical Breakthrough Platform for New-generation Semiconductive Materials

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