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The pH-dependent contributions of radical species during the removal of aromatic acids and bases in light/chlorine systems

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Affiliation of Author(s):环境研究院

Journal:Chemical Engineering Journal

First Author:安泽秀

Document Code:C300C90646984FF9A50B022B3695A57C

Volume:433

Number of Words:7

Translation or Not:no

Date of Publication:2022-04-01

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