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    Cu2O thin films deposited by reactive direct current magnetron sputtering

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    • Institution:晶体材料研究所

    • Title of Paper:Cu2O thin films deposited by reactive direct current magnetron sputtering

    • Journal:Thin Solid Films

    • First Author:Huang Baibiao

    • Document Code:lw-101475

    • Volume:517

    • Issue:19

    • Page Number:5700

    • Translation or Not:No

    • Date of Publication:2009-08

    • Release Time:2019-04-13
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