中文

Cu2O thin films deposited by reactive direct current magnetron sputtering

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  • Affiliation of Author(s):晶体材料研究所

  • Journal:Thin Solid Films

  • First Author:Huang Baibiao

  • Indexed by:Unit Twenty Basic Research

  • Document Code:lw-101475

  • Volume:517

  • Issue:19

  • Page Number:5700

  • Translation or Not:no

  • Date of Publication:2009-08-03

  • Date of Publication:2009-08-03

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