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Structural and electrical properties of K0.5Bi0.5TiO3 thin films for ferroelectric field effect transistor applications

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  • Affiliation of Author(s):晶体材料研究所

  • Journal:Journal of Physics D-Applied Physics

  • All the Authors:zhangxiaoyang,qinxiaoyan,weijiyong

  • First Author:Huang Baibiao

  • Indexed by:Unit Twenty Basic Research

  • Document Code:lw-79563

  • Volume:42

  • Issue:4

  • Translation or Not:no

  • Date of Publication:2009-01-30

  • Date of Publication:2009-01-30
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