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Hydrogen Doped Metal Oxide Semiconductors with Exceptional and Tunable Localized Surface Plasmon Resonances

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  • Affiliation of Author(s):晶体材料研究所

  • Journal:J. Am. Chem. Soc.

  • All the Authors:Dai Ying

  • First Author:CHENG Hefeng

  • Indexed by:Unit Twenty Basic Research

  • Document Code:31AAB4E1D0A44742B94C053EEAA29726

  • Volume:138

  • Page Number:9316

  • Translation or Not:no

  • Date of Publication:2016-07-06

  • Date of Publication:2016-07-06
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