中文

具有空间氧空位分布的BiVO4光催化材料及其制备方法与应用

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  • Affilication of Author(s):晶体材料研究院

  • Type of Patent:发明

  • Application Number:202211164548.0

  • Number of Inventors:8

  • Service Invention or Not:no

  • Application Date:2022-09-23

  • Publication Date:2024-04-05

  • Authorization Date:2024-04-05

  • Publication Date:2024-04-05

  • Application Date:2022-09-23

  • Authorization Date:2024-04-05

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