New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection
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Institution:国家胶体材料工程技术研究中心
Title of Paper:New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection
Journal:polymers
First Author:刘俊俊
Document Code:C76060312FBA41D080C191512BE59258
Volume:15
Issue:7
Number of Words:8000
Translation or Not:No
Date of Publication:2023-03
Release Time:2023-05-18
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