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Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists

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Affiliation of Author(s):国家胶体材料工程技术研究中心

Journal:polymers

First Author:刘俊俊

Document Code:DCE1A78A48074FA5A119FBCBE5F756DE

Volume:16

Issue:6

Number of Words:8000

Translation or Not:no

Date of Publication:2024-03-15

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