Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists
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Institution:国家胶体材料工程技术研究中心
Title of Paper:Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists
Journal:polymers
First Author:刘俊俊
Document Code:DCE1A78A48074FA5A119FBCBE5F756DE
Volume:16
Issue:6
Number of Words:8000
Translation or Not:No
Date of Publication:2024-03
Release Time:2024-05-25