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Enhanced Lithography Performance with Imino/Imido Benzenesulfonate Photoacid Generator-Bound Polymer Resists

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Affiliation of Author(s):国家胶体材料工程技术研究中心

Journal:small

First Author:刘越

Document Code:0EFD617AD3DF4747ABA77208E807326A

Issue:2412297

Number of Words:8

Translation or Not:no

Date of Publication:2025-03-05

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