Enhanced Lithography Performance with Imino/Imido Benzenesulfonate Photoacid Generator-Bound Polymer Resists
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Institution:国家胶体材料工程技术研究中心
Title of Paper:Enhanced Lithography Performance with Imino/Imido Benzenesulfonate Photoacid Generator-Bound Polymer Resists
Journal:small
First Author:刘越
Document Code:0EFD617AD3DF4747ABA77208E807326A
Issue:2412297
Number of Words:8
Translation or Not:No
Date of Publication:2025-03
Release Time:2025-03-21