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Surface plasmon enhanced photochemical etching of p-type GaP: a direct demonstration of wavelength selectivity

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Institution:晶体材料研究所

Title of Paper:Surface plasmon enhanced photochemical etching of p-type GaP: a direct demonstration of wavelength selectivity

Journal:Physical chemistry chemical physics

First Author:Duo Liu

Document Code:lw-164305

Volume:16

Page Number:20216

Translation or Not:No

Date of Publication:2014-08

Release Time:2019-04-14

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