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Electordepositon of submicron/nanoscale Cu2O/Cu junctions in an ultrathin CuSO4 solution layer

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Affiliation of Author(s):晶体材料研究院

Journal:Journal of Electroanalytical Chemistry

All the Authors:yuguangwei,huxiaobo,Duo Liu,sundaliang,lijing,zhanghuaijin,wangjiyang,

First Author:yuguangwei

Document Code:lw-84491

Volume:638

Page Number:225

Translation or Not:no

Date of Publication:2010-01-15

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