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Institution:晶体材料研究院（晶体材料全国重点实验室）

Title of Paper:Surface plasmon enhanced photochemical etching of p-type GaP: a direct demonstration of wavelength selectivity

Journal:Physical chemistry chemical physics

First Author:Duo Liu

All the Authors:Duo Liu

Document Code:lw-164305

Volume:16

Page Number:20216

Number of Words:4

Translation or Not:No

Date of Publication:2014-08

Release Time:2019-10-24