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Effect of argon pressure on the structure and resistivity of dc magnetron sputtered LaB6 films

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  • Affiliation of Author(s):材料科学与工程学院

  • Journal:Applied Mechanics and Materials.

  • First Author:胡立杰

  • Indexed by:Unit Twenty Basic Research

  • Document Code:77BFCDF1E9E74A23858D27FB9412BD23

  • Issue:303-306

  • Page Number:2519

  • Number of Words:5

  • Translation or Not:no

  • Date of Publication:2013-02-13

  • Date of Publication:2013-02-13
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