秦晓燕
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Structural and electrical properties of K0.5Bi0.5TiO3 thin films for ferroelectric field effect transistor applications
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Affiliation of Author(s): : 晶体材料研究所

Title of Paper: : Structural and electrical properties of K0.5Bi0.5TiO3 thin films for ferroelectric field effect transistor applications

Journal: : Journal of Physics D-Applied Physics

All the Authors: : zhangxiaoyang,qinxiaoyan,weijiyong

First Author: : Huang Baibiao

Indexed by: : Unit Twenty Basic Research

Document Code: : lw-79563

Volume: : 42

Issue: : 4

Translation or Not: : no

Date of Publication: : 2009-01-30

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Engineer

Gender : Female

Status : Employed

School/Department : 晶体材料研究院

Date of Employment : 1985-07-01

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