Institution:晶体材料研究院（晶体材料全国重点实验室）
Title of Paper:Structural and electrical properties of K0.5Bi0.5TiO3 thin films for ferroelectric field effect transistor applications
Journal:Journal of Physics D-Applied Physics
First Author:Huang Baibiao
All the Authors:张晓阳,秦晓燕,尉吉勇,Huang Baibiao
Document Code:lw-79563
Volume:42
Issue:4
Translation or Not:No
Date of Publication:2009-01
Release Time:2019-10-24
Engineer
Gender : Female
School/Department : 晶体材料研究院
Date of Employment : 1985-07
Faculty/School : Institute of Crystal Materials
The Last Update Time : ..
