秦晓燕山东大学主页平台管理系统--中文主页

Structural and electrical properties of K0.5Bi0.5TiO3 thin films for ferroelectric field effect transistor applications: 点击次数：; 所属单位：晶体材料研究所; 发表刊物：Journal of Physics D-Applied Physics; 全部作者：张晓阳,秦晓燕,尉吉勇; 第一作者：黄柏标; 论文类型：基础研究; 论文编号：lw-79563; 卷号：42; 期号：4; 是否译文：否; 发表时间：2009-01-30

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