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Rapid epitaxy of 2-inch and high-quality alpha-Ga2O3 films by mist-CVD method

Release time:2024-05-15|Hits:

Affiliation of Author(s):晶体材料研究院

Journal:Journal of Semiconductors

First Author:Wang, Xiaojie

Document Code:1678970499690606594

Volume:44

Issue:6

Number of Words:4000

Translation or Not:no

Date of Publication:2023-06-01

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