一种卤化亚汞单晶体的生长装置及方法

Release time:2019-04-15|Hits:

Affilication of Author(s):晶体材料研究所

Patent Applicant:Xutang Tao

Type of Patent:发明

Application Number:2018106011050

Number of Inventors:2

Service Invention or Not:no

Application Date:2018-06-12