High patterning photosensitivity by a novel fluorinated copolymer formulated resist
Affiliation of Author(s):
晶体材料研究院
Journal:
European Polymer Journal
First Author:
郭雅娜
Document Code:
1787755554102599681
Volume:
211
Number of Words:
6
Translation or Not:
no
Copyright All Rights Reserved Shandong University Address: No. 27 Shanda South Road, Jinan City, Shandong Province, China: 250100 Information desk: (86) - 0531-88395114 On Duty Telephone: (86) - 0531-88364731 Construction and Maintenance: Information Work Office of Shandong University
