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High patterning photosensitivity by a novel fluorinated copolymer formulated resist

Release Time:2024-12-19| Hits:

Institution:晶体材料研究院（晶体材料全国重点实验室）

Title of Paper:High patterning photosensitivity by a novel fluorinated copolymer formulated resist

Journal:European Polymer Journal

First Author:郭雅娜

Document Code:1787755554102599681

Volume:211

Number of Words:6

Translation or Not:No

Date of Publication:2024-05

Release Time:2024-12-19

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