nX6QyRwLppJScFiaWRgYXnrElIIvoPf6Ba0CXlUkNeT2y4cdgjWXHBVpKR3x

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Enhanced Lithography Performance with Imino/Imido Benzenesulfonate Photoacid Generator-Bound Polymer Resists

Release Time:2025-03-21| Hits:

Institution:国家胶体材料工程技术研究中心

Title of Paper:Enhanced Lithography Performance with Imino/Imido Benzenesulfonate Photoacid Generator-Bound Polymer Resists

Journal:small

First Author:刘越

Document Code:0EFD617AD3DF4747ABA77208E807326A

Issue:2412297

Number of Words:8

Translation or Not:No

Date of Publication:2025-03

Release Time:2025-03-21

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