Enhanced Lithography Performance with Imino/Imido Benzenesulfonate Photoacid Generator-Bound Polymer Resists
Affiliation of Author(s):
国家胶体材料工程技术研究中心
Journal:
small
First Author:
刘越
Document Code:
0EFD617AD3DF4747ABA77208E807326A
Issue:
2412297
Number of Words:
8
Translation or Not:
no
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