Intense Single Red Emission Induced by Near-Infrared Irradiation Using a Narrow Bandgap Oxide BiVO4 as the Host for Yb3+ and Tm3+ Ions

发布时间:2019-10-25| 点击次数:

所属单位:晶体材料研究院(晶体材料全国重点实验室)

论文名称:Intense Single Red Emission Induced by Near-Infrared Irradiation Using a Narrow Bandgap Oxide BiVO4 as the Host for Yb3+ and Tm3+ Ions

发表刊物:Advanced Optical Materials

第一作者:黄慧宁

全部作者:秦晓燕,戴瑛,周广军,王泽岩,黄柏标,王朋,张晓阳

论文编号:5467E6745DF34ECD945CAB27E3628563

卷号:6

期号:15

是否译文:否

发表时间:2018-08

发布时间:2019-10-25