山东大学教师主页王素梅 Eco-friendly, low-temperature solution production of oxide thin films for high-performance transistors via infrared irradiation of chloride precursors Home

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Eco-friendly, low-temperature solution production of oxide thin films for high-performance transistors via infrared irradiation of chloride precursors

Release Time:2019-10-24 Hits:

Institution:材料科学与工程学院
Journal:Ceramics International
First Author:王素梅
All the Authors:王素梅
Document Code:30CBA41A7E254B51BAF1A9D1ECB8583B
Volume:45
Issue:8
Page Number:9829
Translation or Not:No
Date of Publication:2019-07

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Eco-friendly, low-temperature solution production of oxide thin films for high-performance transistors via infrared irradiation of chloride precursors