山东大学教师主页王素梅 Universal solution-processed high-k amorphous oxide dielectrics for high-performance organic thin film transistors Home

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Universal solution-processed high-k amorphous oxide dielectrics for high-performance organic thin film transistors

Release Time:2019-10-24 Hits:

Institution:材料科学与工程学院
Journal:RSC Advance
First Author:王素梅
All the Authors:王素梅
Document Code:lw-155536
Translation or Not:No
Date of Publication:2014-01

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Universal solution-processed high-k amorphous oxide dielectrics for high-performance organic thin film transistors