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Sol-gel processed high-k aluminum oxide dielectric films for fully solution-processed low-voltage thin-film transistors

Release Time:2019-10-24 Hits:

Institution:材料科学与工程学院
Journal:Ceramics International
First Author:Xia, Wenwen
All the Authors:王素梅
Document Code:E1ED76533B5F466EB560B11401BC831A
Volume:44
Issue:8
Page Number:9125
Translation or Not:No
Date of Publication:2018-01