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Charge-trapping memory based on tri-layer alumina gate stack and InGaZnO channel

Release Time:2022-01-18
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Institution:
集成电路学院
Title of Paper:
Charge-trapping memory based on tri-layer alumina gate stack and InGaZnO channel
Journal:
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
First Author:
马鹏飞
Document Code:
419298800B7E4787B96E7EF0679BE71C
Volume:
35
Issue:
5
Number of Words:
5000
Translation or Not:
No
Date of Publication:
2020-05
Release Time:
2022-01-18