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Charge-trapping memory based on tri-layer alumina gate stack and InGaZnO channel

Release time:2022-01-18
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Affiliation of Author(s):
微电子学院
Journal:
SEMICONDUCTOR SCIENCE AND TECHNOLOGY
First Author:
马鹏飞
Indexed by:
Unit Twenty Basic Research
Document Code:
419298800B7E4787B96E7EF0679BE71C
Volume:
35
Issue:
5
Number of Words:
5000
Translation or Not:
no
Date of Publication:
2020-05-01