Title:具有空间氧空位分布的BiVO4光催化材料及其制备方法与应用
Institution:晶体材料研究院（晶体材料全国重点实验室）
Type of Patent:Invent
Application Number:202211164548.0
Number of Inventors:8
Service Invention or Not:No
Application Date:2022-09-23
Publication Date:2024-04-05
Authorization Date:2024-04-05
Release Time:2024-05-21