Associate Professor
Supervisor of Master's Candidates
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Effect of argon pressure on the structure and resistivity of dc magnetron sputtered LaB6 films
Affiliation of Author(s):材料科学与工程学院
Journal:Applied mechanics and materials
All the Authors:Zhang Lin
First Author:MIN Guanghui
Indexed by:Unit Twenty Basic Research
Document Code:lw-151419
Volume:303-306
Page Number:2519-2523
Translation or Not:no
Date of Publication:2013-02-13