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论文成果

Gao Li'ao, Wu Hongjin, Dang Juan*, Zhang Shibo*, Tian Shuai*, Zhang Qingzhu, Wang Wenxing. New insight into the removal process of benzotriazole UV stabilizers by UV/H2O2: Integrating quantum chemical calculation with CFD simulation

所属单位：

环境研究院
发表刊物：

Journal of Hazardous Materials
论文编号：

56810935B65A4509A103C03A864F3390
卷号：

459
页面范围：

132245
字数：

7
是否译文：

否
发表时间：

2023-10-01

上一条：Zhang Shibo, Dang Juan*, Díaz-Somoano Mercedes, Zhang Qingzhu. Theoretical insight into the influence of SO2 on the adsorption and oxidation of mercury over the MnO2 surface

下一条：Zhang Shibo, Wu Hongjin, Gao Li'ao, Dang Juan*, Zhang Qingzhu, Wang Wenxing. Atmospheric oxidation of (E)-β-farnesene initiated by hydroxyl radical: New formation mechanism of HOMs