外部和内部因素对纳米晶合金kHz级饱和磁化过程影响的微磁学分析

Release time:2019-10-23|Hits:

Affiliation of Author(s):电气工程学院

Journal:电工技术学报

All the Authors:zouliang,zhangli,Zhao Tong

First Author:韩智云

Indexed by:Applied Research

Document Code:CBFC504B51374F71A4C9C3EDA0F01FB8

Volume:34

Issue:8

Page Number:1589

Translation or Not:no

Date of Publication:2019-04-25