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外部和内部因素对纳米晶合金kHz级饱和磁化过程影响的微磁学分析
Release Time:2019-10-25
  • Institution:
    电气工程学院
  • Journal:
    电工技术学报
  • First Author:
    韩智云
  • All the Authors:
    邹亮,张黎,赵彤
  • Document Code:
    CBFC504B51374F71A4C9C3EDA0F01FB8
  • Volume:
    34
  • Issue:
    8
  • Page Number:
    1589
  • Number of Words:
    6
  • Translation or Not:
    No
  • Date of Publication:
    2019-04
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