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外部和内部因素对纳米晶合金kHz级饱和磁化过程影响的微磁学分析

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Affiliation of Author(s):电气工程学院

Journal:电工技术学报

All the Authors:zouliang,zhangli,Zhao Tong

First Author:韩智云

Indexed by:Applied Research

Document Code:CBFC504B51374F71A4C9C3EDA0F01FB8

Volume:34

Issue:8

Page Number:1589

Translation or Not:no

Date of Publication:2019-04-25

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