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Enhancement-mode Ga2O3 FET with high mobility using p-type SnO heterojunction

发布时间:2023-07-19
点击次数:
所属单位:
微电子学院
发表刊物:
IEEE Electron Device Letters
关键字:
Alumina;Aluminum oxide;Field effect transistors;Gallium compounds;Heterojunctions;II-VI semiconductors;Nanosheets;Semiconducting indium compounds;Zinc oxide;Back channels;Filed-effect-transistor;Gallium oxide (ga2o3);High mobility;Mobility (μ);Mode operation;Nano sheet;P-n heterojunctions;p-Type SnO;Threshold voltage (VTH);Gallium oxide (Ga2O3);filed-effecttransistors (FETs);heterojunction;threshold voltage (V-TH);p-type SnO;mobility (mu)
第一作者:
王珣珣
论文编号:
1478204783637565441
卷号:
43
期号:
1
页面范围:
44-47
字数:
5
是否译文:
发表时间:
2022-01-01