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A novel thermally evaporated etching mask for low-damage dry etching
  • Title of Paper:
    A novel thermally evaporated etching mask for low-damage dry etching
  • Journal:
    IEEE Transactions on Nanotechnology
  • First Author:
    Hanbin Wang
  • Correspondence Author:
    Aimin Song*,Lin Han*
  • All the Authors:
    Qian Xin, Qingpu Wang, Gengchang Zhu,Yiming Wang
  • Volume:
    16
  • Issue:
    2
  • Page Number:
    290-295
  • Translation or Not:
    No
  • Date of Publication:
    2017-02
  • Release Time:
    2024-04-17
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