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A novel thermally evaporated etching mask for low-damage dry etching
  • Journal:
    IEEE Transactions on Nanotechnology
  • All the Authors:
    Yiming Wang, Gengchang Zhu, Qingpu Wang, Qian Xin
  • First Author:
    Hanbin Wang
  • Indexed by:
    Journal paper
  • Correspondence Author:
    Lin Han*,Aimin Song*
  • Volume:
    16
  • Issue:
    2
  • Page Number:
    290-295
  • Translation or Not:
    no
  • Date of Publication:
    2017-02-01

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