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Institution:国家胶体材料工程技术研究中心

Title of Paper:New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection

Journal:POLYMERS

First Author:刘俊俊

Document Code:CDDF6E8A091B46B38261990BEAD7CAEB

Volume:15

Issue:7

Number of Words:6

Translation or Not:No

Date of Publication:2023-04

Release Time:2024-04-19