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New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection

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Affiliation of Author(s):国家胶体材料工程技术研究中心

Journal:POLYMERS

First Author:刘俊俊

Document Code:CDDF6E8A091B46B38261990BEAD7CAEB

Volume:15

Issue:7

Number of Words:6

Translation or Not:no

Date of Publication:2023-04-01

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