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High patterning photosensitivity by a novel fluorinated copolymer formulated resist

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Affiliation of Author(s):国家胶体材料工程技术研究中心

Journal:European Polymer Journal

First Author:郭雅娜

Document Code:632A914D660F42579579A8D0504ACA08

Volume:211

Issue:无

Page Number:113009

Number of Words:8000

Translation or Not:no

Date of Publication:2024-05-15

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