Hits:

Institution:国家胶体材料工程技术研究中心

Title of Paper:Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists

Journal:Polymers

First Author:刘俊俊

Document Code:1777985786281746433

Volume:16

Issue:6

Number of Words:5

Translation or Not:No

Date of Publication:2024-03

Release Time:2024-12-19