BOoIvtSKUgPCVvW4EAf5UjtM3uZvvW8xXpPvBYdzCxL6xjMc4s54jqo1Ykkq
Current position: Home >> Scientific Research >> Paper Publications

Controlled in-situ reduction strategy for synthesis of transparent conductive metal meshes using tannic acid-based photoresists

Hits:

Institution:国家胶体材料工程技术研究中心

Title of Paper:Controlled in-situ reduction strategy for synthesis of transparent conductive metal meshes using tannic acid-based photoresists

Journal:MICROELECTRONIC ENGINEERING

First Author:郭旭彬

Document Code:2805AD2CFE4D46299C84F4457B85564E

Volume:290

Issue:112196

Number of Words:6

Translation or Not:No

Date of Publication:2024-04

Release Time:2024-12-19

Prev One:Graphite Nitride Carbon (g-C3N4) and Borates as Near-UV Heterogeneous Photoinitiators for Acrylate Photopolymerization

Next One:Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists