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Controlled in-situ reduction strategy for synthesis of transparent conductive metal meshes using tannic acid-based photoresists

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Affiliation of Author(s):国家胶体材料工程技术研究中心

Journal:MICROELECTRONIC ENGINEERING

First Author:郭旭彬

Document Code:2805AD2CFE4D46299C84F4457B85564E

Volume:290

Issue:112196

Number of Words:6

Translation or Not:no

Date of Publication:2024-04-22

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