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一种基于单宁酸的正性光刻材料及其制备方法、光刻胶体系及在制备微纳电路中的应用

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Affilication of Author(s):国家胶体材料工程技术研究中心

Type of Patent:发明

Application Number:202111418612.9

Number of Inventors:3

Service Invention or Not:no

Application Date:2021-11-26

Publication Date:2024-08-02

Authorization Date:2024-08-02

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