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Influence of Schottky drain contacts on the strained AlGaN barrier layer of AlGaN/AlN/GaN heterostructure field-effect transistors

Release Time:2019-04-14
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Institution:
微电子学院
Title of Paper:
Influence of Schottky drain contacts on the strained AlGaN barrier layer of AlGaN/AlN/GaN heterostructure field-effect transistors
Journal:
Chinese Physics B
Document Code:
lw-145401
Volume:
22
Issue:
4
Translation or Not:
No
Date of Publication:
2012-08
Release Time:
2019-04-14