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采用射频磁控溅射法在Si (111) 衬底上生长β-Ga2O3 薄膜

Release time:2019-04-14
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Affiliation of Author(s):
物理学院
Journal:
《功能材料》
All the Authors:
Ma Jin,linzhaojun,Fujian Zong,zhangxijian,luancaina
First Author:
xiaohongdi
Indexed by:
Unit Twenty Basic Research
Document Code:
lw-73891
Volume:
v 37
Issue:
n SUPPL.
Page Number:
1
Translation or Not:
no
Date of Publication:
2006-10-15