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Preparation and characterization of Al2xIn22xO3 films deposited on MgO (10 0) by MOCVD

Release time:2019-06-06
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Affiliation of Author(s):
微电子学院
Journal:
Materials Research Bulletin
All the Authors:
luancaina,Feng Xianjin
First Author:
Ma Jin
Indexed by:
Unit Twenty Basic Research
Document Code:
lw-171206
Translation or Not:
no
Date of Publication:
2015-07-16