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Characterization of tunable band gap aluminum indium oxide films prepared on SiO2 (0001) by MOCVD

Release time:2019-06-06
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Affiliation of Author(s):
微电子学院
Journal:
Journal of Materials Science: Materials in Electronics
All the Authors:
luancaina
First Author:
Ma Jin
Indexed by:
Unit Twenty Basic Research
Document Code:
lw-178176
Translation or Not:
no
Date of Publication:
2016-01-08