Characterization of tunable band gap aluminum indium oxide films prepared on SiO2 (0001) by MOCVD
Release time:2019-10-24
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- Affiliation of Author(s):
- 集成电路学院
- Journal:
- Journal of Materials Science: Materials in Electronics
- All the Authors:
- Ma Jin,luancaina
- First Author:
- 马瑾
- Document Code:
- lw-178176
- Number of Words:
- 4
- Translation or Not:
- no
- Date of Publication:
- 2016-01-08