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Characterization of Rutile SnO2 Epitaxial Films Grown on MgF2 (001) Substrates by MOCVD

Release time:2022-11-16
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Affiliation of Author(s):
集成电路学院
Journal:
CRYSTAL RESEARCH AND TECHNOLOGY
First Author:
栾彩娜
Document Code:
0594DF206D0340898C8FFB48CD9E2B87
Volume:
53
Issue:
10
Number of Words:
3000
Translation or Not:
no
Date of Publication:
2018-09-21