Atomic layer deposition of an Al2O3 dielectric on ultrathin graphit by using electron beam irradiation
Release Time:2019-04-14
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- Institution:
- 物理学院
- Title of Paper:
- Atomic layer deposition of an Al2O3 dielectric on ultrathin graphit by using electron beam irradiation
- Journal:
- Journal of Semiconductors
- First Author:
- 蒋然
- All the Authors:
- Meng lingguo,Xijian Zhang
- Document Code:
- lw-140562
- Volume:
- 33
- Issue:
- 9
- Page Number:
- 093004-1
- Translation or Not:
- No
- Date of Publication:
- 2012-09
- Release Time:
- 2019-04-14