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Atomic layer deposition of an Al2O3 dielectric on ultrathin graphit by using electron beam irradiation

Release time:2019-04-14
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Affiliation of Author(s):
物理学院
Journal:
Journal of Semiconductors
All the Authors:
Meng lingguo,zhangxijian
First Author:
jiangran
Indexed by:
Applied Research
Document Code:
lw-140562
Volume:
33
Issue:
9
Page Number:
093004-1
Translation or Not:
no
Date of Publication:
2012-09-10