Atomic layer deposition of an Al2O3 dielectric on ultrathin graphit by using electron beam irradiation
Release time:2019-10-22
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- Affiliation of Author(s):
- 物理学院
- Journal:
- Journal of Semiconductors
- All the Authors:
- Meng lingguo,zhangxijian
- First Author:
- jiangran
- Indexed by:
- Applied Research
- Document Code:
- lw-140562
- Volume:
- 33
- Issue:
- 9
- Page Number:
- 093004-1
- Translation or Not:
- no
- Date of Publication:
- 2012-09-10