中文

环形掩膜版、光场调控方法、单像素成像方法及系统

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  • Affilication of Author(s):信息科学与工程学院

  • Type of Patent:发明

  • Application Number:202110250723.7

  • Number of Inventors:1

  • Service Invention or Not:no

  • Application Date:2021-03-08

  • Publication Date:2023-06-16

  • Authorization Date:2023-06-16

  • Publication Date:2023-06-16

  • Application Date:2021-03-08

  • Authorization Date:2023-06-16

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