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A Strategy To Prepare High-Quality Monocrystalline Graphene: Inducing Graphene Growth with Seeding Chemical Vapor Deposition and Its Mechanism
Release Time:2021-06-01
  • Institution:
    晶体材料研究院（晶体材料全国重点实验室）
  • Journal:
    ACS Applied Materials & Interfaces
  • First Author:
    李妍璐
  • Document Code:
    30C0D22F63DB4CF596614121E63AC4D9
  • Issue:
    12
  • Number of Words:
    5
  • Translation or Not:
    No
  • Date of Publication:
    2019-12
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