Wej5vMOZsacQbOc2oXAvdzI7SaAtTcRaFCah6uqolnM95hi1oytnzwqI2YcE

Paper Publications

Home >> Scientific Research >> Paper Publications

High patterning photosensitivity by a novel fluorinated copolymer formulated resist

Release Time:2024-05-25| Hits:

Institution:国家胶体材料工程技术研究中心

Title of Paper:High patterning photosensitivity by a novel fluorinated copolymer formulated resist

Journal:European Polymer Journal

First Author:郭雅娜

Document Code:632A914D660F42579579A8D0504ACA08

Volume:211

Issue:无

Page Number:113009

Number of Words:8000

Translation or Not:No

Date of Publication:2024-05

Release Time:2024-05-25

Prev One:
Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists
Next One:
Fully electrical controllable spin-orbit torque based half-adder

中文    |   MOBILE Version   |   Login   |   SDU   

Copyright All Rights Reserved Shandong University Address: No. 27 Shanda South Road, Jinan City, Shandong Province, China: 250100
Information desk: (86) - 0531-88395114
On Duty Telephone: (86) - 0531-88364731 Construction and Maintenance: Information Work Office of Shandong University

Click: Times

The Open Time: --

The Last Update Time: --