High patterning photosensitivity by a novel fluorinated copolymer formulated resist
Affiliation of Author(s):
国家胶体材料工程技术研究中心
Journal:
European Polymer Journal
First Author:
郭雅娜
Document Code:
632A914D660F42579579A8D0504ACA08
Volume:
211
Issue:
无
Page Number:
113009
Number of Words:
8000
Translation or Not:
no
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